Application:Exposure system for LC manufacturing,Exposure system for IC manufacturing,Exposure system for PCB manufacturing,Automatic Sun Beam Condenser,Reflecting Telescope.
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Maximum Size (Spherical Mirror) Diagoal Distanse: up to 4100mm Special Radius: R=5000mm R=6000mm R=7000mm R=8000mm R=10000mm R=12000mm It is possible to produce it excluding the above-mentioned radius. |
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